Temperature Invariant, Nearly Zero Temperature Coefficient of Resistivity in Si‐Doped Titanium Nitrides Ti─Si─N thin films exhibiting a near-zero temperature coefficient of resistivity (0.05 ppm K−1) across 80–420 K is developed for precision electronics. Achieved through atomic layer deposition, the f...

Very happy to see our work published in Advanced Materials! Temperature Invariant, Nearly Zero Temperature Coefficient of Resistivity in Si‐Doped Titanium Nitrides - Berriel - Advanced Materials - Wiley Online Library advanced.onlinelibrary.wiley.com/doi/10.1002/...

ACS announces millions in funding for students affected by terminated grants The grants will help students within 1 year of completion of their degree

The American Chemical Society announced that the ACS Board of Directors has approved $2.5 million to be granted to graduate students who have been impacted by the termination or cancellation of their adviser’s research grant(s) cen.acs.org/acs-news/acs... #chemsky

Thank you Professor @brandicossairt.bsky.social (Professor of Chemistry, University of Washington), MRSEC partner for a wonderful talk on quantum dots at UCF!!! We had an an incredible time learning about the frontiers of quantum dot chemistry and engineering. #mrsec #prem #nsf

Coating 300 square meters of nanoparticles using #atomiclayerdeposition with in situ #massspectrometry

A rotary bed reactor turns on its axis and churns powder much like an oak barrel!
Depending on the rotations per minute (rpm) various turbulence regimes can be accessed for powder processing.

First videos on nanoparticle behavior simulated in our powder ALD model reactors. Thanks to @Eric Bissell for his wonderful creations to push the technology on #atomiclayerdeposition #powderALD Inspired by @jrvo.bsky.social at #tudelft

Thanks Kelly Olenyik, Andrea Carroll and the entire MEMC staff for the amazing experience!

@uw_memc hosted their annual Pack Forest Conference near Mt Rainier WA. Two days of great distraction-free, scientific discussions. Thanks to all faculty and students who participated from the PREM center!

Effect of Atomic Layer Deposited Al2O3 on Sintering Behavior of ZnO Nanopowders Atomic layer deposition (ALD) is demonstrated as an effective technique for conformally coating nanoparticles with ultrathin diffusion barrier layers to control grain growth during sintering. In this study, ALD aluminum oxide (Al2O3) films are deposited on zinc oxide (ZnO) nanoparticles (∼60 nm diameter) and subjected to sintering at 850 °C under uniaxial loading of 150 MPa. Uncoated ZnO forms a densified ceramic with grain sizes of 2.76 ± 0.50 μm. In contrast, ALD-coated nanoparticles exhibit restricted grain growth. A 1 nm Al2O3 coating limits the sintered ZnO grains to 89 ± 23 nm, and a 10 nm coating restricts the ZnO grains to 55 ± 7 nm. These results underscore the effectiveness of ALD to engineer grain boundary diffusion barriers and, when integrated with conventional processing methods, its potential for enabling the scalable manufacturing of nanocrystalline ceramics for use as transparent bulk materials with noncubic crystal structures.

@ericbissell's first, first-author paper is a beautiful demonstration of the use of ALD in restricting grain grown in bulk ceramics. Thanks to all collaborators!
Effect of Atomic Layer Deposited Al2O3 on Sintering Behavior of ZnO Nanopowders | ACS Applied Nano Materials pubs.acs.org/doi/10.1021/...

In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma The etching of ZnO thin films using acetylacetone (Hacac) doses with long exposure times, followed by purging and subsequent exposure to O2 plasma, is studied i

Nice collab work highlighting tandem ellipsometry and spectrometry to study atomic scale processes. Thanks to #NSFPREM award for support.
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma pubs.aip.org/avs/jva/arti...

CQMIEE participated at the Quantum Materials and Atomic Layer Processing (ALP) workshop held at TU/e. Great exchange of ideas between Quantum and ALP communities. Thanks to the Plasma Materials and Processing(PMP) for organizing this.

Thanks Joachim Schnadt for a great time at MaxIV. What an amazing synchrotron facility this is! You have a great team and so much to do at the beamline in ALD. Thanks also to Hendrik Pedersen for a happy surprise ! See you in ALD Korea soon.

Thank you Professor Joey Talghader from the University of Minnesota for spending time with our talented researchers Taylor Cook and Luis Tomar, and your informative talk on IR materials.

Thank you @jrvo.bsky.social for hosting me at TUDelft and a wonderful time with your group. So much to do in powder ALD. Lets keep the interaction alive!

I had a great time presenting my talk on “ALD in situ diagnostics and Machine Learning insights” at CIC Nanogune, San Sebastian. Thanks Mato Knez for the wonderful hosting and some incredible discussions.

It was great to get to know Anjana Devi, Harish Parala and Martin Knaut and the entire staff and team for Solid State Chemistry @Leibniz Institute Dresden. Looking forward to productive interactions in the future!!!

Congratulations Eric Bissell on winning the best poster award for “Atomic Layer Deposition on powders for better ceramics”, at the Florida Semiconductor Institute’s 2025 Conference! We are all proud of you!!! fsi.institute.ufl.edu/2025/02/2025...

Had a great time with Ola Nielsen, @redekop-evgeniy.bsky.social Henrik Sonsteby, and Pers-Anders Hansen at the University of Oslo. Besides talking about ALD and Catalysis we connected on common friends from our past… What a small world Evgeniy! Once more thanks Ola for making it happen.

The Florida Semiconductor Summit was held at the L3 Technology Center in Palm Bay, FL. Advancing future chip technologies are group members Terrick (TJ) McNealy-James, Luis Tomar, Eric Bissell & G M Syamala Rao. Collab w/ @mcelweewhite.bsky.social @UFL. Funding by #NSF, @premucf.bsky.social

Returning the favor: ALD for catalysts or catalytic reactions for ALD? - Department of Chemistry Atomic Layer Deposition (ALD) enables precise surface engineering by exerting control over film structure and composition at the nanoscale. This idea has led to the use of ALD for developing efficient...

Excited about my upcoming talk at the University of Oslo. Excited to meet Ola Nielsen and thanks for organizing this.
www.mn.uio.no/kjemi/englis...

Recently we fed our own paper on highly conducting black titania by Berriel et al., to DeepSeek and asked it the key parameters used in the paper. See the snapshot below. It is accurate and it took less than 10 seconds. We are staring at a new era in how we do Science.

As a Banerjee Lab member we are very proud of your achievements. Keep it up!

Blaine Mauri-Newell bags an internship with Intel OR for summer 2025. Blaine was a PREM1 student and an REU student at MEMC for 2024.

Blaine Mauri-Newell bags an internship with Intel OR for summer 2025. Blaine was a PREM1 star student and an REU student at MEMC for 2024. He will be interning at the Ronler Acres Facility in Hillsboro.

Way to go!!! Congrats Ayelen.

Amazing to see PREM student Ayelen Mora (MSE, junior) attend the MaterialZ Winter School in Nanomaterials at the Biosphere in Arizona and win the BEST POSTER AWARD! Way to go Ayelen!!! We are all so proud of you.

Productive time discussing the molecular chemistry of thin films with @mcelweewhite.bsky.social and @jurcalab today. Here’s to more collaboration and joint projects in 2025!!!

Banerjee Group and alum at #avs70!!!

Congratulations @taylorcook on your first poster presentation at #avs70!!! Way to gooooo!

Congratulations @luistomar for bagging the best UG poster award at #avs70! You did us proud.